研磨瀝青 / 吸附蠟
Polishing Pitch /
Adhesive Wax
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研磨瀝青 / 吸附蠟

Polishing Pitch & Adhesive Wax

研磨瀝青適用於高精度的拋光製程,主要依據瀝青的可塑性,對應不同加工條件與工件特性,協助取得精準且穩定的拋光面。可依研磨精度、操作性及加工效率需求,選用不同等級的研磨用瀝青。

Polishing pitch is suitable for high-precision polishing processes. Based on the plasticity of pitch, different grades can be selected according to processing conditions and workpiece characteristics to achieve accurate and stable polished surfaces.

貼付用瀝青、接著蠟具有低熔點高黏度的特性,可有效保護與固定加工元件,使加工元件於研磨或拋光過程中維持穩定貼附,有助於達到平坦化表面拋光效果。

Mounting pitch and adhesive wax feature low melting temperature and high viscosity, providing effective protection and secure fixation of workpieces during grinding or polishing, helping achieve stable planarization and surface polishing.

其中,研磨光學玻璃用瀝青可依針入度軟化點區分不同規格,適用於高精度、中等精度至粗加工或大面積研磨作業,可依實際製程需求選擇合適產品。

Pitch for optical glass polishing can be classified by penetration and softening point. It is suitable for high-precision, medium-precision, rough, and large-area polishing applications, allowing users to select the appropriate grade based on actual process requirements.

產品特色
Product Features
  • 可依加工精度與工件特性選用不同等級之研磨瀝青。
    Different grades of polishing pitch can be selected according to polishing accuracy and workpiece characteristics.
  • 適用於光學玻璃等高精度研磨、拋光製程。
    Suitable for high-precision grinding and polishing processes, such as optical glass applications.
  • 研磨瀝青具良好可塑性,有助於取得穩定且精準的拋光面。
    Good plasticity helps achieve stable and precise polished surfaces.
  • 貼付用瀝青、接著蠟具低溫及高黏度特性,可有效固定與保護加工元件。
    Mounting pitch and adhesive wax provide low melting temperature and high viscosity for secure workpiece fixation and protection.
  • 適用於平坦化表面拋光、研磨加工固定及相關貼付製程。
    Applicable to planarization polishing, workpiece mounting, and related bonding processes.
研磨光學玻璃用瀝青
Pitch for Optical Glass Polishing

研磨光學玻璃用瀝青為代表性高精度通用型產品,可依針入度範圍區分不同等級。針入度較低者適合高精度研磨作業;針入度較高者則適合中等精度、粗加工或大面積研磨作業,具備穩定性佳、操作容易與經濟實用等特點。

Pitch for optical glass polishing is a general-purpose product for high-precision applications. Grades are classified by penetration range. Lower penetration grades are suitable for high-precision polishing, while higher penetration grades are suitable for medium-precision, rough, or large-area polishing operations, offering good stability, easy operation, and practical cost performance.

研磨光學玻璃用瀝青 K1-K5 示意圖
產品規格
Product Specifications
型號
Type
針入度
Penetration
軟化點
Softening Point
適用說明
Application
K1 0~5 100℃ 以上
Above 100℃
適用於高精度研磨作業,軟化點高,適合高溫加工,穩定性佳。
Suitable for high-precision polishing. High softening point, suitable for high-temperature processing with excellent stability.
K3 11~15 80℃ 以上
Above 80℃
適用於一般精密研磨作業,平衡性佳,加工效率穩定。
Suitable for general precision polishing, offering good balance and stable processing efficiency.
K4 16~20 70℃ 以上
Above 70℃
適用於中等精度研磨作業,操作性良好,加工表面效果均勻。
Suitable for medium-precision polishing, with good operability and uniform surface results.
K5 21~25 70℃ 以上
Above 70℃
適用於粗加工或大面積研磨作業,加工效率高,經濟實用。
Suitable for rough processing or large-area polishing, offering high efficiency and practical cost performance.
適用範圍
Applications
  • 光學玻璃研磨與拋光製程。
    Optical glass grinding and polishing processes.
  • 高精度表面修整與平坦化加工。
    High-precision surface finishing and planarization processing.
  • 研磨製程中工件固定、貼付與保護。
    Workpiece mounting, bonding, and protection during grinding processes.
  • 中等精度、粗加工或大面積研磨作業。
    Medium-precision, rough, or large-area polishing applications.
產品說明
Product Description

研磨瀝青可依不同針入度與軟化點條件,對應不同研磨精度、加工效率及操作需求。使用者可依工件材質、加工溫度與表面品質要求,選擇合適的瀝青等級,以提升研磨穩定性與表面加工品質。

Polishing pitch can be selected according to different penetration and softening point conditions to meet various requirements for polishing accuracy, processing efficiency, and operability. Users can choose the appropriate pitch grade based on workpiece material, processing temperature, and surface quality requirements to improve polishing stability and surface finish.

貼附用瀝青與接著蠟則適合用於加工前之工件固定,可降低加工過程中位移風險,並協助達到穩定的平坦化拋光效果。

Mounting pitch and adhesive wax are suitable for workpiece fixation before processing. They help reduce displacement during processing and support stable planarization and polishing performance.