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PU-Coated Polishing Pads
主要用於精拋製程，其表面依照塗佈配方與發泡的溫度可區分為精緻型及粗糙型等種類，並依照背底基材可生產不用厚度之拋光墊，可撘配不同的拋光液適合於：光電元件(GaAS, Gap, InP, Sapphire, Si wafer…)、玻璃元件精拋、金屬元件精拋…，主要為精拋光製程中增進平坦度、去除刮傷之重要的製程，並可搭配不同的SBR進行曲面玻璃拋光。
Primarily used in precision polishing processes, PU-coated polishing pads feature surfaces that can be categorized into fine-textured and coarse-textured types, depending on the coating formulation and foaming temperature. These pads can be manufactured in various thicknesses based on different backing materials.
They are compatible with a wide range of polishing slurries and are suitable for the final polishing of optoelectronic components (such as GaAs, GaP, InP, Sapphire, Si wafers), glass components, and metal parts. PU-coated polishing pads play a critical role in enhancing surface flatness and removing micro-scratches during final finishing steps.
Additionally, they can be used in conjunction with various SBR (Styrene-Butadiene Rubber) materials for curved glass polishing applications.
