
FSP系列拋光液是由高純度的膠態氧化矽微粒(colloidal silica)所組成,依照不同的粒徑可區分為三個等級,適用於矽晶圓、石英晶體、藍寶石、鋰酸鈮、鉭酸鈮、合金金屬…元件的拋光使用。
The FSP series polishing slurry is composed of high-purity colloidal silica particles. It is available in three grades based on particle size, and is suitable for polishing a variety of components including silicon wafers, quartz crystals, sapphire, lithium niobate, tantalum niobate, and alloy metals.
| 製品名 Product |
FSP-050 | FSP-080 | FSP-100 |
| Content of SiO2(%) | 40 | 40 | 40 |
| pH | 10.2 | 10.2 | 10.2 |
| Specific Gravity | 1.3 | 1.3 | 1.3 |
| Particle Size(nm) | 45 | 75 | 100 |
| Package | 25KG | 25KG | 25KG |
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