IN-Q10 系列 INP 拋光液

IN-Q10 為雙田拋光液配方組，內容物包含催化粉（Catalyst Granule）與二氧化矽拋光液（Colloidal Silica Slurry）。依建議比例搭配去離子水調配後，可形成完整拋光液系統，適用於標準化 INP 拋光製程，並具有高移除率、低刮傷率特點。

IN-Q10 is a polishing slurry formulation set composed of Catalyst Granule and Colloidal Silica Slurry. After mixing with deionized water according to the recommended ratio, it forms a complete polishing slurry system suitable for standardized INP polishing processes, featuring high removal rate and low scratch rate.

• 內容物包含催化粉與二氧化矽拋光液，依建議比例搭配去離子水即可完成調配。
  Composed of Catalyst Granule and Colloidal Silica Slurry; can be prepared by mixing with deionized water according to the recommended ratio.
• 調配比例清楚，適合用於需要標準化調配流程的 INP 拋光製程。
  Clear mixing ratio, suitable for INP polishing processes that require standardized preparation procedures.
• 具有高移除率、低刮傷率特點，可兼顧加工效率與表面品質。
  Features high removal rate and low scratch rate, helping balance processing efficiency and surface quality.
• 提供大包裝與小包裝規格，可依製程需求選擇適合調配量。
  Available in both large and small package configurations for different process volume requirements.

備註 Note：使用前請先詳閱 SDS（安全資料表），並遵守安全操作規範。
Please read the SDS（Safety Data Sheet）before use and follow all safety handling instructions.

大包裝：IN-Q10(A) 催化粉 120 g／IN-Q10(B) 二氧化矽拋光液 20 L。
Large Package: IN-Q10(A) Catalyst Granule 120 g / IN-Q10(B) Colloidal Silica Slurry 20 L.

小包裝：IN-Q10(A) 催化粉 6 g／IN-Q10(B) 二氧化矽拋光液 1 L。
Small Package: IN-Q10(A) Catalyst Granule 6 g / IN-Q10(B) Colloidal Silica Slurry 1 L.